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Concept of floating-dot memory transistors on silicon-on-insulator substrate

✍ Scribed by O. Winkler; F. Merget; M. Heuser; B. Hadam; M. Baus; B. Spangenberg; H. Kurz


Book ID
114155398
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
443 KB
Volume
61-62
Category
Article
ISSN
0167-9317

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Submicron nonvolatile memory transistors were fabricated by exposing silicon-on-insulator (SOI) buried oxides to hydrogen at elevated temperatures to generate mobile protons in the buried oxides. By switching the polarity of the bias to the SOI substrate, the mobile protons in the buried oxide were