Comparison of the damage and contamination produced by CF4 and CF4/H2 reactive ion etching: The role of hydrogen

✍ Scribed by Mu, X. C.; Fonash, S. J.; Rohatgi, A.; Rieger, J.

• Book ID: 126837334
• Publisher: American Institute of Physics
• Year: 1986
• Tongue: English
• Weight: 519 KB
• Volume: 48
• Category: Article
• ISSN: 0003-6951
• DOI: 10.1063/1.96452