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Comparison of the characteristics of TiO2films prepared by low-pressure and plasma-enhanced chemical vapor deposition

✍ Scribed by S. S. Huang; J. S. Chen

Book ID: 110323259
Publisher: Springer US
Year: 2002
Tongue: English
Weight: 816 KB
Volume: 13
Category: Article
ISSN: 0957-4522
DOI: 10.1023/a:1013698006169

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