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Comparison of surface roughness of polished silicon wafers measured by light scattering topography, soft-x-ray scattering, and atomic-force microscopy

✍ Scribed by Teichert, C.; MacKay, J. F.; Savage, D. E.; Lagally, M. G.; Brohl, M.; Wagner, P.

Book ID: 120075894
Publisher: American Institute of Physics
Year: 1995
Tongue: English
Weight: 462 KB
Volume: 66
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.113978

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