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Comparison of organic thin films deposited by supersonic molecular-beam epitaxy and organic molecular-beam epitaxy: The case of titanyl phthalocyanine

✍ Scribed by K. Walzer; T. Toccoli; A. Pallaoro; S. Iannotta; C. Wagner; T. Fritz; K. Leo


Book ID
108279321
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
376 KB
Volume
600
Category
Article
ISSN
0039-6028

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HfO 2 dielectric layers were grown on the p-type Si(1 0 0) substrate by metal-organic molecular beam epitaxy (MOMBE). Hafnium-tetrabutoxide [Hf(Oβ€’t-C 4 H 9 ) 4 ] was used as a Hf precursor and argon gas was used as a carrier gas. The microstructure and thickness of HfO 2 films were measured by scann