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Modeling growth rate of HfO2 thin films grown by metal–organic molecular beam epitaxy

✍ Scribed by Myoung-Seok Kim; Young-Don Ko; Tae-Houng Moon; Jae-Min Myoung; Ilgu Yun

Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
665 KB
Volume
37
Category
Article
ISSN
0026-2692

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