Comparison of atomic scale etching of poly-Si in inductively coupled Ar and He plasmas

✍ Scribed by Hyung Jin Yun; Tae Ho Kim; Chee Burm Shin; Chang-Koo Kim; Jae-Ho Min; Sang Heup Moon

• Book ID: 107513707
• Publisher: Springer US
• Year: 2007
• Tongue: English
• Weight: 400 KB
• Volume: 24
• Category: Article
• ISSN: 0256-1115
• DOI: 10.1007/s11814-007-0023-9