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Comparison between radical- and energetic ion-induced growth of SiCxNy films in plasma immersion ion implantation and deposition

✍ Scribed by Afanasyev-Charkin, I. V.; Nastasi, M.


Book ID
118750516
Publisher
American Institute of Physics
Year
2004
Tongue
English
Weight
328 KB
Volume
96
Category
Article
ISSN
0021-8979

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