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Comparing deposition of organic and inorganic siloxane films by the atmospheric pressure glow discharge

โœ Scribed by Lan Zhou; Guo-Hua Lv; Hua Pang; Guo-Ping Zhang; Si-Ze Yang


Book ID
113919587
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
834 KB
Volume
206
Category
Article
ISSN
0257-8972

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Mass Spectrometry (MS) analyses, up to 300 amu, were performed on linear hexamethyldisiloxane (HMDSO) and cyclic octamethylcyclotetrasiloxane (OMCTSO) vapors in low frequency plasmas (40 kHz). The fragmentation rates of the precursors, and possible oligomerization in the gas phase, depend on the pla