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Comparative study of hydrogen adsorption on Ge(100) and Ge(111) surfaces

โœ Scribed by L. Surnev; M. Tikhov


Book ID
118985599
Publisher
Elsevier Science
Year
1984
Tongue
English
Weight
662 KB
Volume
138
Category
Article
ISSN
0039-6028

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Trimethylsilane (TMSiH) was adsorbed onto a Ge(100) surface at a temperature of ร”150 ยป 3 ร„C and x-ray photoelectron spectroscopy (XPS) was used to study the resulting surface species as functions of the TMSiH exposure in Langmuir (L). The core-level C 1s, Si 2p and Ge 3d photoelectrons were monitore