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Comparative study of gate oxide in 4H-SiC lateral MOSFETs subjected to post-deposition-annealing in N2O and POCl3

✍ Scribed by P. Fiorenza, L. K. Swanson, M. Vivona, F. Giannazzo, C. Bongiorno…


Book ID
120782820
Publisher
Springer
Year
2013
Tongue
English
Weight
807 KB
Volume
115
Category
Article
ISSN
1432-0630

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