Comparative mid- and far-infrared spectroscopy of nitrogen–oxygen complexes in silicon
✍ Scribed by H.Ch. Alt; H.E. Wagner
- Publisher
- Elsevier Science
- Year
- 2009
- Tongue
- English
- Weight
- 253 KB
- Volume
- 404
- Category
- Article
- ISSN
- 0921-4526
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The electrical activity of nitrogen±oxygen (N±O) complexes in nitrogen-doped Czochralski (NCZ) silicon treated by hydrogen plasma was investigated. It was observed that in the hydrogenated NCZ samples the absorption line intensity of m-N±O (N±O complexes inducing middle infrared absorption lines) de
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