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Comment on “The effects of Si doping on dislocation movement and tensile stress in GaN films” [J. Appl. Phys. 109, 073509 (2011)]

✍ Scribed by Dadgar, A.; Krost, A.


Book ID
121080426
Publisher
American Institute of Physics
Year
2011
Tongue
English
Weight
103 KB
Volume
110
Category
Article
ISSN
0021-8979

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