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Combinatorial-mold imprint lithography: A versatile technique for fabrication of three-dimensional polymer structures

✍ Scribed by H. Y. Low; W. Zhao; J. Dumond


Book ID
126680644
Publisher
American Institute of Physics
Year
2006
Tongue
English
Weight
505 KB
Volume
89
Category
Article
ISSN
0003-6951

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## Abstract A technique to create arrays of micrometer‐sized patterns of photosensitive polymers on the surface of elastomeric stamps and to transfer these patterns to planar and nonplanar substrates is presented. The photosensitive polymers are initially patterned through detachment lithography (D