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Cleaning technology for improved gate oxide integrity

✍ Scribed by M. Meuris; S. Verhaverbeke; P.W. Mertens; H.F. Schmidt; M.M. Heyns; M. Kubota; A. Philipossian; K. Dillenbeck; D. Gräf; A. Schnegg; R. de Blank

Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 655 KB
Volume: 22
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(93)90123-m

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