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ChemInform Abstract: Remote Plasma-Enhanced CVD of Fluorinated Silicon Nitride Films.

✍ Scribed by S. E. ALEXANDROV; M. L. HITCHMAN

Publisher
John Wiley and Sons
Year
2010
Weight
26 KB
Volume
28
Category
Article
ISSN
0931-7597

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## Abstract ChemInform is a weekly Abstracting Service, delivering concise information at a glance that was extracted from about 100 leading journals. To access a ChemInform Abstract of an article which was published elsewhere, please select a β€œFull Text” option. The original article is trackable v