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ChemInform Abstract: Deposition of Aluminum Nitride Thin Films by MOCVD from the Trimethylaluminum-Ammonia Adduct.

✍ Scribed by A. C. JONES; S. A. RUSHWORTH; D. J. HOULTON; J. S. ROBERTS; V. ROBERTS; C. R. WHITEHOUSE; G. W. CRITCHLOW

Book ID: 112038780
Publisher: John Wiley and Sons
Year: 2010
Weight: 28 KB
Volume: 27
Category: Article
ISSN: 0931-7597
DOI: 10.1002/chin.199642001

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