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Chemical vapour deposition on silicon: In situ surface studies

✍ Scribed by J.S. Foord; R.B. Jackman


Publisher
Elsevier Science
Year
1984
Tongue
English
Weight
425 KB
Volume
112
Category
Article
ISSN
0009-2614

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We combine in situ X-ray photoelectron spectroscopy and ex situ electron and Raman spectroscopy to study chemical interactions of SiO 2 -supported Fe catalyst films during C 2 H 2 exposure in the 400-600 1C temperature range. Carbon nanotubes nucleate at C 2 H 2 pressures below 10 Γ€6 mbar, which all