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Chemical thermodynamics for optimization of epitaxial film deposition processes

✍ Scribed by F.A. Kuznetsov

Publisher
Elsevier Science
Year
1972
Tongue
English
Weight
495 KB
Volume
13
Category
Article
ISSN
0040-6090

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πŸ“œ SIMILAR VOLUMES

54 Model of the epitaxial chemical vapor
54 Model of the epitaxial chemical vapor deposition reactor for design and performance optimization
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lode1 of the epltaxlal chemical vanor denosltlon reactor 1s develoved based on fundamental physlcochemlcal nrlnclqles. Kknetrcs of the heterogeneous denosltlon reactlon 1s taken Into account slmultaneouslv with transnort nhenomena which occur In the gas nhase above denosltlon surface. Obtalned set o