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Characterization of ZnO: Al films deposited by r.f. magnetron-sputtering at low temperature

โœ Scribed by Xiaotao Hao; Jin Ma; Honglei Ma; Maohua Tian; Baocheng Cao; Lina Ye; Chuanfu Cheng; Shuyun Teng

Book ID
111783799
Publisher
SP Science China Press
Year
2002
Tongue
English
Weight
375 KB
Volume
45
Category
Article
ISSN
1674-7283

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## Abstract Hexagonal aluminium nitride (AlN) and zinc oxide (ZnO) thin films have been deposited by DC and RF reactive magnetron sputtering at room temperature. For a first set of samples, sputtered AlN films were deposited on silicon ZnO substrate. For a second set, ZnO films were deposited on Al