✦ LIBER ✦

Characterization of vapor phase deposited organic molecules on silicon surfaces

✍ Scribed by S. Dieckhoff; R. Höper; V. Schlett; T. Gesang; W. Possart; O.-D. Hennemann; J. Günster; V. Kempter

Publisher: Springer
Year: 1997
Tongue: English
Weight: 273 KB
Volume: 358
Category: Article
ISSN: 1618-2650
DOI: 10.1007/s002160050400

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Analysis of vapor-deposited silicon carb

Analysis of vapor-deposited silicon carbide films on silicon ribbon surfaces

✍ Yang, K. H. ;Schwuttke, G. H. 📂 Article 📅 1978 🏛 John Wiley and Sons 🌐 English ⚖ 682 KB

Spectroscopic ellipsometric characteriza

Spectroscopic ellipsometric characterization of organic films obtained via organic vapor phase deposition

✍ C. Himcinschi; N. Meyer; S. Hartmann; M. Gersdorff; M. Friedrich; H.-H. Johannes 📂 Article 📅 2005 🏛 Springer 🌐 English ⚖ 474 KB

Vapor-Phase Deposition of Monofunctional

Vapor-Phase Deposition of Monofunctional Alkoxysilanes for Sub-Nanometer-Level Biointerfacing on Silicon Oxide Surfaces

✍ Brian Dorvel; Bobby Reddy Jr.; Ian Block; Patrick Mathias; Susan E. Clare; Brian 📂 Article 📅 2010 🏛 John Wiley and Sons 🌐 English ⚖ 692 KB

Surface vibrational studies of organic m

Surface vibrational studies of organic molecule chemisorption on silicon

✍ M.N. Piancastelli; M.K. Kelly; G. Margaritondo; J. Anderson; D.J. Frankel; G.J. 📂 Article 📅 1986 🏛 Elsevier Science 🌐 English ⚖ 212 KB

Nucleation and growth of vapor phase dep

Nucleation and growth of vapor phase deposition on solid surfaces

✍ Quan-De Wu 📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 306 KB

Characterization and Application of the

Characterization and Application of the Vapor Phase Decomposition Technique for Trace Metal Analysis on Silicon Oxide Surfaces

✍ Hall, L. H.; Sees, J. A.; Schmidt, B. L. 📂 Article 📅 1996 🏛 John Wiley and Sons 🌐 English ⚖ 606 KB

Vapor phase decomposition-droplet surface etching-graphite furnace atomic absorption spectroscopy (VPD-DSE-GFAAS) is discussed as a technique for the determination of low levels of metals in chemical oxides on silicon surfaces. The VPD-DSGGFAAS technique was found to be statistically equivalent to r