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Characterization of the microstructure of Co thin film on silicon substrate by TEM

✍ Scribed by Z. L. Zhang; Z. G. Xiao; X. B. Wu; Z. S. Yu


Book ID
107452410
Publisher
Springer US
Year
2000
Tongue
English
Weight
816 KB
Volume
29
Category
Article
ISSN
0361-5235

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## Abstract Co doped C films with different Co volume fraction __x__~v~ were fabricated using facing‐target sputtering at room temperature. The as‐deposited films are composed of ∼2 nm amorphous Co granules dispersed in a‐C matrix, and their morphology is composition independent. The graphitized ca