Characterization of Surface-Oxidized Phase in Silicon Nitride and Silicon Oxynitride Powders by X-ray Photoelectron Spectroscopy
β Scribed by Kiyoshi Okada; Koyo Fukuyama; Yoshikazu Kameshima
- Book ID
- 110826947
- Publisher
- John Wiley and Sons
- Year
- 1995
- Tongue
- English
- Weight
- 642 KB
- Volume
- 78
- Category
- Article
- ISSN
- 0002-7820
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Overlayers of SiO 2 (nominally 4, 6 and 8 nm thick) on silicon, prepared by thermal oxidation, were investigated using x-ray photoelectron spectroscopy (XPS). The thickness of these overlayers was obtained from a measurement of the photoelectron intensities originating from the substrate and the oxi