✦ LIBER ✦
The effects of silicon nitride and silicon oxynitride intermediate layers on the properties of tantalum pentoxide films on silicon: X-ray photoelectron spectroscopy, X-ray reflectivity and capacitance–voltage studies
✍ Scribed by M. Passacantando; F. Jolly; L. Lozzi; V. Salerni; P. Picozzi; S. Santucci; C. Corsi; D. Zintu
- Book ID
- 117984955
- Publisher
- Elsevier Science
- Year
- 2003
- Tongue
- English
- Weight
- 272 KB
- Volume
- 322
- Category
- Article
- ISSN
- 0022-3093
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