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Characterization of strained Si wafers by X-ray diffraction techniques

✍ Scribed by Takayoshi Shimura; Kohta Kawamura; Masahiro Asakawa; Heiji Watanabe; Kiyoshi Yasutake; Atsushi Ogura; Kazunori Fukuda; Osami Sakata; Shigeru Kimura; Hiroki Edo; Satoshi Iida; Masataka Umeno

Publisher: Springer US
Year: 2008
Tongue: English
Weight: 503 KB
Volume: 19
Category: Article
ISSN: 0957-4522
DOI: 10.1007/s10854-008-9641-1

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