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Characterization of interconnect interfacial adhesion by cross-sectional nanoindentation

✍ Scribed by T. Scherban; D. Pantuso; B. Sun; S. El-Mansy; J. Xu; M.R. Elizalde; J.M. Sánchez; J.M. Martínez-Esnaola

Book ID
111546352
Publisher
Springer Netherlands
Year
2003
Tongue
English
Weight
162 KB
Volume
119/120
Category
Article
ISSN
1573-2673

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Cross-sectional nanoindentation: a new t
Cross-sectional nanoindentation: a new technique for thin film interfacial adhesion characterization
✍ J.M. Sánchez; S. El-Mansy; B. Sun; T. Scherban; N. Fang; D. Pantuso; W. Ford; M. 📂 Article 📅 1999 🏛 Elsevier Science 🌐 English ⚖ 284 KB

AbstractÐInterfacial adhesion is becoming a critical material property for improving the reliability of multilayer thin ®lm structures used in microelectronics. Cross-sectional nanoindentation (CSN) is a new mechanical test especially designed for measuring the fracture toughness of thin ®lm interfa