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Characterization of high quality RTCVD relaxed Si1−xGexgrown on ge graded buffer layers on Si by photoluminescence spectroscopy

✍ Scribed by G. Bremond; A. Souifi; O. De Baeros; A. Benmansour; F. Ducroquet; P. Warren; D. Dutartre


Book ID
112817144
Publisher
Springer US
Year
1996
Tongue
English
Weight
470 KB
Volume
25
Category
Article
ISSN
0361-5235

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