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Characterization of CNx/SiOyfilms prepared by the inductively coupled RF discharge

✍ Scribed by M. Eliáš; L. Zajíčková; V. Buršíková; J. Janča

Publisher
Springer
Year
2000
Tongue
English
Weight
97 KB
Volume
50
Category
Article
ISSN
0011-4626

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In this work a single Langmuir probe has been used to determine in-situ the plasma electronic temperature (T e ) and the electronic density (h e ) of an rf magnetron sputtering system used to grow CN x films. Sodium chloride substrates and a carbon target (99.999%) in a mixture of Ar/N 2 were used.