Comparison study of physical vapor-depos
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Jin Zhao; E.Gene Garza; Kinsang Lam; Clive M Jones
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Article
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2000
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Elsevier Science
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English
โ 197 KB
## ลฝ . ลฝ . The chemical compositions of physical vapor-deposited PVD and chemical vapor-deposited CVD titanium nitride ลฝ . ลฝ . TiN thin films were investigated by X-ray photoelectron spectroscopy XPS . The effect of a H rN plasma treatment on 2 2 the chemical composition of CVD TiN thin film was a