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Characterization of catalytic chemical vapor-deposited SiCN thin film coatings

✍ Scribed by Suresh Neethirajan, Takahita Ono, Esashi Masayoshi

Book ID
119915436
Publisher
Springer-Verlag
Year
2012
Tongue
English
Weight
289 KB
Volume
2
Category
Article
ISSN
2228-5326

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## Abstract Atmospheric pressure chemical vapor deposition (APCVD) of niobium sulfide coatings was achieved on glass substrates from the reaction of NbCl~5~ and S(SiMe~3~)~2~, __t__Bu~2~S~2~, __t__BuSH, or HSCH~2~CH~2~SH at 250βˆ’600 Β°C. The niobium sulfide films grown at temperatures above 500 Β°C we