Characterization of a RF/dc-magnetron discharge for the sputter deposition of transparent and highly conductive ITO films
β Scribed by M. Bender; J. Trube; J. Stollenwerk
- Publisher
- Springer
- Year
- 1999
- Tongue
- English
- Weight
- 129 KB
- Volume
- 69
- Category
- Article
- ISSN
- 1432-0630
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π SIMILAR VOLUMES
An earlier study of the magnetron sputtering of copper in this laboratory has shown that the growth rate in Ar for a dc magnetron is almost twice that for an rf system with an identical target, operated at the same indicated power input. Experiments have been made to find whether the difference in t
Cu-Al-O thin films were prepared by rf magnetron sputtering. By adjusting oxygen partial pressure, the effect of oxygen on optical transmission and electrical properties of the films were investigated. The films exhibit good transparency in the visible range. As oxygen partial pressure is above 30%,