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Characterization and application of a-SiCx:H films for the passivation of the c-Si surface

✍ Scribed by I. Martı&#x0301;n; M. Vetter; A. Orpella; J. Puigdollers; C. Voz; L.F. Marsal; J. Pallarès; R. Alcubilla

No coin nor oath required. For personal study only.

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