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Characteristics of MOS diodes fabricated using sputter-deposited W or Cu/W films

✍ Scribed by Spiros Tsevas; Maria Vasilopoulou; Dimitrios N. Kouvatsos; Thanassis Speliotis; Dimitris Niarchos

Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 221 KB
Volume: 83
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2006.01.081

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