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Characteristics of DLC containing Ti and Zr films deposited by reactive magnetron sputtering

โœ Scribed by Guojia Ma; Guoqiang Lin; Gang Sun; Huafang Zhang; Hongchen Wu


Book ID
113846516
Publisher
Elsevier
Year
2011
Tongue
English
Weight
362 KB
Volume
18
Category
Article
ISSN
1875-3892

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Emission properties of Ti-DLC films prep
โœ H.F. Liang; Z.H. Liang; C.L. Liu; L.G. Meng ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 565 KB

The field emission properties of Ti-DLC films in diode and coplanar device structures were studied. An emission current density of 1.14 A/cm 2 could be obtained at an applied field of 33 V/mm and the threshold field was 24 V/mm for the coplanar emission structure. The silicon substrate was found to