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Characteristics of compressed magnetic field (CMF) magnetron sputtering technique using magnetic target

โœ Scribed by Tomonobu Hata; Katsuaki Ohtsubo; Toshio Hada; Takakazu Takahashi

Book ID
112076164
Publisher
John Wiley and Sons
Year
1986
Tongue
English
Weight
636 KB
Volume
69
Category
Article
ISSN
8756-663X

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Characteristics of vanadium dioxide film
Characteristics of vanadium dioxide films deposited by RF-magnetron sputter deposition technique using V-metal target
โœ Sun Jin Yun; Jung Wook Lim; Byung-Gyu Chae; Bong Jun Kim; Hyun-Tak Kim ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 145 KB

Vanadium dioxide films were deposited using reactive RF-magnetron sputter deposition technique and characterized without or with post-annealing process for the application of thermal sensors. The film thickness variation on a 4-in wafer was less than 72%. As-deposited film showing an abrupt metal-in