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Characteristics in chemical-mechanical polishing of copper: comparison of polishing pads

✍ Scribed by Z. Stavreva; D. Zeidler; M. Plötner; K. Drescher

Book ID
118569369
Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
702 KB
Volume
108
Category
Article
ISSN
0169-4332

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