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Characterisation of HfO2 deposited by photo-induced chemical vapour deposition

✍ Scribed by Q. Fang; J.-Y. Zhang; Z.M. Wang; J.X. Wu; B.J. O'Sullivan; P.K. Hurley; T.L. Leedham; H. Davies; M.A. Audier; C. Jimenez; J.-P. Senateur; Ian W. Boyd

Book ID: 108388556
Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 249 KB
Volume: 427
Category: Article
ISSN: 0040-6090
DOI: 10.1016/s0040-6090(02)01181-1

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