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Hf1−xSixOy dielectric films deposited by UV-photo-induced chemical vapour deposition (UV-CVD)

✍ Scribed by M. Liu; L.Q. Zhu; G. He; Z.M. Wang; J.X. Wu; J.-Y. Zhang; I. Liaw; Q. Fang; Ian W. Boyd

Book ID
103818879
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
926 KB
Volume
253
Category
Article
ISSN
0169-4332

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✍ Q. Fang; J.Y. Zhang; Z.M. Wang; G. He; J. Yu; Ian W. Boyd 📂 Article 📅 2003 🏛 Elsevier Science 🌐 English ⚖ 426 KB

An overview of our recent work on thin films of metal oxides deposited on silicon by a novel excimer lamp-assisted ultraviolet injection liquid source CVD (UVILS-CVD) process for advanced high-k gate dielectrics applications will be presented. Recent results on TiO , Ta O , ZrO , HfO , and TiO -dope