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Channeling implantation of B and P in silicon

✍ Scribed by R.J. Schreutelkamp; V. Raineri; F.W. Sans; R.E. Kaim; J.F.M. Westendorp; P.F.H.M. van der Meulen; K.T.F. Janssen

No coin nor oath required. For personal study only.

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