𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Cell adhesion property of cathodic arc plasma deposited CrN thin film

✍ Scribed by Sun Kyu Kim; Vuong Hung Pham

Book ID
107524485
Publisher
The Minerals, Metals & Materials Society
Year
2009
Tongue
English
Weight
524 KB
Volume
61
Category
Article
ISSN
1047-4838

No coin nor oath required. For personal study only.

πŸ“œ SIMILAR VOLUMES

Cathodic arc deposition of copper oxide
Cathodic arc deposition of copper oxide thin films
✍ R.A. MacGill; S. Anders; A. Anders; R.A. Castro; M.R. Dickinson; K.M. Yu; I.G. B πŸ“‚ Article πŸ“… 1996 πŸ› Elsevier Science 🌐 English βš– 545 KB
Cathodic arc plasma deposition of nano-m
Cathodic arc plasma deposition of nano-multilayered Zr–O/Al–O thin films
✍ Sun Kyu Kim; Vinh Van Le; R.L. Boxman; V.N. Zhitomirsky; Jeong Yong Lee πŸ“‚ Article πŸ“… 2010 πŸ› Elsevier Science 🌐 English βš– 527 KB

Thin films of Zr-O/Al-O were deposited on SKD 11 tool steel substrate using Zr and Al cathodes in a cathodic arc plasma deposition system. The substrates were mounted on a rotating holder which alternatively exposed them to plasma from the two cathodes. The influence of the Zr and Al cathode arc cur

Characterization of Cr-doped TiO2 thin f
Characterization of Cr-doped TiO2 thin films prepared by cathodic arc plasma deposition
✍ Mu-Hsuan Chan; Wei-Yu Ho; Da-Yung Wang; Fu-Hsing Lu πŸ“‚ Article πŸ“… 2007 πŸ› Elsevier Science 🌐 English βš– 621 KB

Cr-doped TiO 2 thin films were prepared by co-sputtering of titanium and chromium in a cathodic arc plasma evaporation system. X-ray diffraction (XRD), Auger electron spectroscopy (AES), field emission scanning electron microscopy (FE-SEM), and water contact angle measurement were used to characteri