Cathodic deposition of amorphous silicon
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T.R. Rama Mohan; F.A. KrΓΆger
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Article
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1982
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Elsevier Science
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English
β 588 KB
A-t----Amorphous silicon containing cubon, hydrogen and fiuorine were ekctrodeposited from solutions contaittmg cthyicrrc glycol, hydrofluoric acid, and tetraethyl orthosilicate or sihcie seid. The deposits were charscterizcd by electrical titance and ir reflectance nKaauremcnts. The deposits exhibi