Cathodic deposition of amorphous silicon from solutions of silicic acid and tetraethyl ortho-silicate in ethylene glycol and formamide containing HF
✍ Scribed by T.R. Rama Mohan; F.A. Kröger
- Book ID
- 103066913
- Publisher
- Elsevier Science
- Year
- 1982
- Tongue
- English
- Weight
- 588 KB
- Volume
- 27
- Category
- Article
- ISSN
- 0013-4686
No coin nor oath required. For personal study only.
✦ Synopsis
A-t----Amorphous silicon containing cubon, hydrogen and fiuorine were ekctrodeposited from solutions contaittmg cthyicrrc glycol, hydrofluoric acid, and tetraethyl orthosilicate or sihcie seid. The deposits were charscterizcd by electrical titance and ir reflectance nKaauremcnts. The deposits exhibited point contact electrical m&tams from lo* to 1Ol4 ohm cm-' which could be changed by making suitable M in fhe -position of the electrolyte or the cabditions of electrolysis. The candtivity of the dcpmits wasehangcd from p to n-type by doping with phosphorus achieved by adding tricthyl phosphate to the cktrolyte.