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Cathodic Deposition of Amorphous Alloys of Silicon, Carbon, and Fluorine

โœ Scribed by Lee, C. H.


Book ID
115511045
Publisher
The Electrochemical Society
Year
1982
Tongue
English
Weight
685 KB
Volume
129
Category
Article
ISSN
0013-4651

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The influence of carbon content on the crystallization process has been investigated for the excimer laser annealed hydrogenated amorphous silicon carbon alloy films deposited by Plasma Enhanced Chemical Vapour Deposition (PECVD) technique, using silane methane gas mixture diluted in helium, as well