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Carbon nitride thin films prepared by a capacitively coupled RF plasma jet

โœ Scribed by G. Dinescu; E. Aldea; P. Boieriu; G. Musa; A. Andrei; M. Dinescu; G.J.H. Brussaard; R.J. Severens; M.C.M. van de Sanden; D.C. Schram


Book ID
114168443
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
440 KB
Volume
120
Category
Article
ISSN
0168-583X

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Preparation and characterization of hydr
โœ Junying Hao; Tao Xu; Weimin Liu ๐Ÿ“‚ Article ๐Ÿ“… 2005 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 295 KB

Carbon nitride films (CN x films) were deposited on Si(1 0 0) substrates making use of dual direct current radio frequency (DC-RF) plasma enhanced chemical vapor deposition (PECVD), using a mixed gas of CH 4 and N 2 as the source gas. The microstructures, morphologies, and compositions of the result