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Carbon hard masks for etching sub-90 nm structures

✍ Scribed by Kevin A. Pears; Momtchil Stavrev; Alessia Scire; Ralf Koepe; Matthias Markert; Ulrich Egger; Lee Donohue

No coin nor oath required. For personal study only.

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Carbon hard masks for etching sub-90&#xa0;nm structures