✦ LIBER ✦
Integrated process of photoresist trimming and dielectric hard mask etching for sub-50 nm gate patterning
✍ Scribed by Vladimir Bliznetsov; Rakesh Kumar; Huizhen Lin; Kah-Wee Ang; Won Jong Yoo; Anyan Du
- Book ID
- 108289175
- Publisher
- Elsevier Science
- Year
- 2006
- Tongue
- English
- Weight
- 241 KB
- Volume
- 504
- Category
- Article
- ISSN
- 0040-6090
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