๐”– Bobbio Scriptorium
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Capability of ion beam projection optics for microfabrication

โœ Scribed by Y. Madokoro; S. Tomimatsu; Y. Kawanami; K. Umemura

Book ID
104306551
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
442 KB
Volume
46
Category
Article
ISSN
0167-9317

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โœฆ Synopsis

Applicability of ion beam projection optics for sputtering fabrication is investigated by using third-order aberration theory. Under the Kthler illumination condition that minimizes off-axial aberration, the total beam current of the shaped beam formed in large-reduction-ratio projection column is larger than that of a conventional focused ion beam. In a preliminary experiment with 50:1-reduction projection optics, the edge blur of the shaped beam is estimated to be less than 0.1 ~tm for a total beam current larger than 30 nA. Ion beam projection optics is thought to be suitable for applications that require high-throughput processing.

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