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Buffer-related gate lag in AlGaN/GaN HEMTs

✍ Scribed by Atsushi Nakajima; Kunitaka Fujii; Kazushige Horio


Book ID
112182409
Publisher
John Wiley and Sons
Year
2012
Tongue
English
Weight
238 KB
Volume
9
Category
Article
ISSN
1862-6351

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## Abstract Gate and drain‐lag effects are studied in (GaN)/InAlN/GaN and InAlN/AlN/GaN HEMTs grown on sapphire. Electron trapping on the surface states between the gate and the drain forming the net negative charge up‐to ∼2 Γ— 10^13^ cm^–2^ is found to be responsible for the gate‐lag effect in the