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Boron-enhanced diffusion of boron from ultralow-energy ion implantation

โœ Scribed by Agarwal, Aditya; Gossmann, H.-J.; Eaglesham, D. J.; Herner, S. B.; Fiory, A. T.; Haynes, T. E.


Book ID
120908497
Publisher
American Institute of Physics
Year
1999
Tongue
English
Weight
273 KB
Volume
74
Category
Article
ISSN
0003-6951

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