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Bias induced structural changes in tungsten nitride films deposited by unbalanced magnetron sputtering

โœ Scribed by S Guruvenket; G Mohan Rao


Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
119 KB
Volume
106
Category
Article
ISSN
0921-5107

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โœ S.H. Mohamed ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 745 KB

The studies of thermal stability of nitride coatings are important since their structural, thermal, electrical and optical properties are drastically modified by the oxidation layer formed on the top of these coatings. Tungsten nitride films were deposited from metallic tungsten target using reactiv